Technical PhD Internship : Optical Critical Dimension (OCD) Metrology and Modeling Development
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This internship offers the opportunity to work on Optical Critical Dimension (OCD) measurements and modeling development for nanoscale diffractive optics. OCD is an essential metrology technique that leverages geometric RCWA simulations to map process parameters for micro- and nano-structured elements. This project provides an excellent opportunity to contribute to a high-impact program while gaining hands-on experience with advanced optical metrology and simulations.
- Develop RCWA-based OCD modeling methodologies for diffractive nanostructures.
- Identify critical degrees of freedom (DOF) and fitting parameters required for optimize diffractive element process maps
- Explore and propose techniques to enhance the accuracy of model fitting compared against ground truth experimental data
- Assess the Gauge Repeatability and Reproducibility (GR&R) of OCD equipment.
- Integrate RCWA findings and improve models for supporting design validation simulations and process control recommendations
- Strong academic background in optical physics, optical engineering, or a related field.
- Experience with OCD metrology, RCWA simulations, or similar optical modeling techniques.
- Analytical mindset with a focus on accuracy and detail in synthesizing simulated and experimental data
- Ability to work independently on complex, research-driven tasks while effectively communicating findings to the team.
- Must hold relevant work permit in Japan for the duration of the internship.
- Currently enrolled in a PhD Program
- Verbal and written communication skills in English.